TOKYO, Dec. 01, 2022 (GLOBE NEWSWIRE) -- Leading semiconductor test equipment supplier Advantest Corporation (TSE: 6857) today unveiled the E5620 Defect Review Scanning Electron Microscope (DR-SEM), ...

The first reflection microscope to use an EUV laser illumination source could provide chip manufacturers with a rapid, on-site method for inspecting lithography masks. A tabletop extreme ultraviolet ...

For years the IC industry has worried about a bevy of issues with the photomask. Mask costs are the top concern, but mask complexity, write times and defect inspection are the other key issues for ...

Extreme ultraviolet (EUV) lithography is once again at a critical juncture. The oft-delayed technology is now being targeted for 7nm. But there are still a number of technologies that must come ...