Startup Substrate is building next-generation semiconductor fabs using advanced X-ray lithography. This goes beyond extreme ...

A lithography strategy that combines ultra-large exposure field and fine-resolution imaging with algorithmic early zone ...

TOKYO--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has begun development of a photomask manufacturing for 2-nanometer (10-9 meter) generation logic semiconductors that support ...

SK Hynix is stepping up its use of extreme ultraviolet (EUV) lithography in next-generation DRAM, increasing the number of EUV layers in its upcoming sixth-generation 10nm-class (1c) products to more ...

TL;DR: SK hynix has deployed the industry's first High-NA EUV lithography machine, the ASML TWINSCAN EXE:5200B, at its M16 fab in South Korea. This advanced system enables 1.7x smaller transistors and ...

Following a tumultuous 2025, the stock has increased by nearly 16% during the first week of January, driven by numerous ...

Glass masks contribute to EUV mask blanks market expansion by offering exceptional surface smoothness, dimensional stability, ...