Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...
Inverse lithography technology (ILT) is a method of using non-Manhattan shapes on the photomask to produce a wafer more resilient to manufacturing variation. It relies on multi-bream mask writing, ...
Some results have been hidden because they may be inaccessible to you
Show inaccessible results
Feedback