TOKYO--(BUSINESS WIRE)--Applied Materials, Inc. today raised CMP * technology to a new level while lowering system cost of ownership (CoO) with the launch of its Applied Reflexion ® GT system for ...
SANTA CLARA, Calif. — Applied Materials, Inc. has a fixed-abrasive chemical mechanical planarization (CMP) system for forming the shallow trench isolation (STI) structures in sub-100nm devices. The ...
SANTA CLARA, Calif. — Applied Materials Inc. has announced the Reflexion LK chemical mechanical polishing (CMP) system, a machine that has a “low down-force” and is intended to planarize a range of ...
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